GaN layers are found to be highly resistive when grown by molecular be
am epitaxy (MBE) using an electron cyclotron resonance (ECR) plasma so
urce. These samples are investigated by Hall effect measurements to ga
in an insight into the conduction mechanism. Both the carrier concentr
ation and the mobility are found to depend exponentially on the temper
ature which is attributed to potential barriers caused by electron tra
ps at grain boundaries. A theoretical model developed for polycrystall
ine materials is found to excellently describe the data. The mobility
shows a pronounced minimum at a room temperature carrier concentration
of 2 x: 10(16) cm(-3), whereas the height of the potential barriers e
xhibits a maximum at the same value. The trap energy and grain size ar
e estimated to be 0.31 eV and 10 to 100 nm, respectively. (C) 1998 Els
evier Science B.V. All rights reserved.