DEVICE PERFORMANCE OF ULTRA-VIOLET EMITTING DIODES GROWN BY MBE

Citation
M. Mayer et al., DEVICE PERFORMANCE OF ULTRA-VIOLET EMITTING DIODES GROWN BY MBE, Journal of crystal growth, 190, 1998, pp. 782-785
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
190
Year of publication
1998
Pages
782 - 785
Database
ISI
SICI code
0022-0248(1998)190:<782:DPOUED>2.0.ZU;2-5
Abstract
Ultra-violet emitting diodes Frith electroluminescence linewidths as n arrow as 8 nm have been grown by molecular beam epitaxy. Double-hetero structure pn- and homotype pin-diodes reveal single-peak emission at w avelengths around 371 nm. The dependence of the optical output power o n the forward current indicates light generation by diffusion current. Turn-on and reverse breakdown voltages are 4-5 V and above 30 V: resp ectively. For the first time, the metalorganic precursor MCp2Mg is emp loyed as p-dopant in nitride molecular beam epitaxy. (C) 1998 Elsevier Science B.V. All rights reserved.