PYROLYSIS OF TERTIARYBUTYLAMINE ALONE AND WITH TRIMETHYLGALLIUM FOR GAN GROWTH

Citation
Z. Liu et al., PYROLYSIS OF TERTIARYBUTYLAMINE ALONE AND WITH TRIMETHYLGALLIUM FOR GAN GROWTH, Journal of crystal growth, 191(1-2), 1998, pp. 1-7
Citations number
26
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
191
Issue
1-2
Year of publication
1998
Pages
1 - 7
Database
ISI
SICI code
0022-0248(1998)191:1-2<1:POTAAW>2.0.ZU;2-J
Abstract
New nitrogen precursors that pyrolyze at low temperatures are desired to replace NH3, for the organometallic vapor phase epitaxial growth of GaN and, especially, GaInN. Tertiarybutylamine (TBAm) is a candidate having a high vapor pressure that is relatively safe compared with oth er potential N sources. In order to test the suitability of TBAm for t he growth of GaN, the pyrolysis was studied in He and H-2 ambients. Th e results of co-pyrolysis studies of TBAm plus trimethylgallium are al so reported. The pyrolysis reactions are relatively complex. In a hydr ogen ambient, the pyrolysis of TBAm alone proceeds mainly via producti on of t-butyl and NH2, radicals. Co-pyrolysis studies show that an add uct is formed at low temperatures, with elimination of CH4. At higher temperatures, the adduct dissociates and co-pyrolysis proceeds mainly as for the individual precursors. TMGa pyrolysis results in the format ion of Ga droplets. (C) 1998 Elsevier Science B.V. All rights reserved .