Sf. Webb et al., DISTRIBUTION OF SPECIES WITHIN AN ETHYLENE ELECTRON-CYCLOTRON RESONANCE-MICROWAVE PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2148-2152
Citations number
11
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Electron cyclotron resonance microwave plasmas consisting of 2% ethyle
ne in hydrogen and 2% ethylene in deuterium have been probed using the
pulsed supersonic, plasma sampling technique. Comparison of the compo
sitions of these two chemically equivalent plasmas provides the basis
for examining the details of species interconversion and overall hydro
carbon chemistry within these plasmas. The ethylene/hydrogen plasma is
shown to be composed of 9% ethane radical (C2H5), 38% ethylene (C2H4)
, 8% ethylene radical (C2H3), and 41% acetylene (C2H2), with the remai
ning counts attributed to impurities in the plasma. Due to interferenc
es between the daughter ions of the radical species and the parent ion
s of ethylene and acetylene, the concentrations of radical species, re
ported above, represent only a lower limit estimate, based only on the
parent ion intensity. Analysis of the mass spectrum obtained for the
analogous deuterium plasma, based on the results from the hydrogen pla
sma experiments, reveal the acetylene components of the deuterium plas
ma to be 14% undeuterated (C2H2), 43% singly deuterated (C2HD), and 43
% doubly deuterated (C2D2). The extensive deuteration of the acetylene
indicates that the majority of the chemistry in these plasmas is repe
ated cycles of hydrogen (deuterium) atom addition to acetylene followe
d by abstractions from the radical species (C2HxD3-x) The absence of a
ny significant intensity due to doubly, triply, or fully deuterated et
hylenes indicates that the addition of hydrogen (deuterium) to the rad
ical species C2HxD3-x is a much more rare event than abstraction. (C)
1998 American Vacuum Society. [S0734-2101(98)09204-5].