Dm. Kim et al., STACKED GATE MID-CHANNEL INJECTION FLASH EEPROM CELL - PART II - ANALYSIS OF GATE CURRENT AND MODELING OF PROGRAMMING CHARACTERISTICS, I.E.E.E. transactions on electron devices, 45(8), 1998, pp. 1703-1709
The programming characteristics of the stacked gate mid-channel inject
ion (SMCI) flash memory cell is quantitatively analyzed vis a vis the
stacked gate device. In the present model, the hot electrons in the hi
gh field channel region are described by the elevated temperature mode
l. The programming speed and efficiency depend, among other factors, o
n the carrier lifetime, which is limited by both the recombination pro
cess and the carrier dwell time in the channel. The gate currents from
the reference devices are quantitatively analyzed and specified empir
ically via the applied voltages and the device parameters. These resul
ts are applied to modeling the shift in time of the threshold voltage
and the simulated values are shown to fit the data with a fair degree
of accuracy.