A. Pieracci et B. Ricco, A NEW CHARACTERIZATION METHOD FOR HOT-CARRIER DEGRADATION IN DMOS TRANSISTORS, I.E.E.E. transactions on electron devices, 45(8), 1998, pp. 1855-1858
This paper presents an original method based on capacitance measuremen
ts, that is able to localize and estimate hot-electron-induced oxide c
harge in double-diffused MOS (DMOS) transistors. The method is validat
ed by means of two-dimensional (2-D) numerical simulation. Preliminary
results obtained with state-of-the-art devices are presented as examp
le of application.