FACET HEATING AND AXIAL TEMPERATURE PROFILES IN HIGH-POWER GAALAS GAAS LASER-DIODES/

Citation
U. Menzel et al., FACET HEATING AND AXIAL TEMPERATURE PROFILES IN HIGH-POWER GAALAS GAAS LASER-DIODES/, Microelectronics and reliability, 38(5), 1998, pp. 821-825
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
38
Issue
5
Year of publication
1998
Pages
821 - 825
Database
ISI
SICI code
0026-2714(1998)38:5<821:FHAATP>2.0.ZU;2-D
Abstract
Degradation of the facets represents a major reason reducing the perfo rmance and the lifetime of high-power laser diodes. Nonradiative surfa ce recombination of electrons and holes results in a strong heating of the facet region and subsequent defect accumulation. We theoretically investigated facet heating of an asymmetrically coated 20-stripe GaAs /GaAlAs laser diode array by a self-consistent calculation of the axia l profiles of temperature, carrier density, and optical intensity. To validate the model, we measured the facet temperature as a function of injection current using micro-Raman spectroscopy. Our results point t o the possibility of catastrophical optical damage at the reflection-c oated facet arising from the asymmetric thermal load of the facets. (C ) 1998 Elsevier Science Ltd. All rights reserved.