DISTRIBUTION OF INTERSTITIAL IMPURITIES ACROSS NB3SN ELECTROLYTIC COATINGS FOR MICROWAVE APPLICATIONS

Citation
Vn. Kolosov et al., DISTRIBUTION OF INTERSTITIAL IMPURITIES ACROSS NB3SN ELECTROLYTIC COATINGS FOR MICROWAVE APPLICATIONS, Inorganic materials, 34(7), 1998, pp. 686-690
Citations number
19
Categorie Soggetti
Material Science
Journal title
ISSN journal
00201685
Volume
34
Issue
7
Year of publication
1998
Pages
686 - 690
Database
ISI
SICI code
0020-1685(1998)34:7<686:DOIIAN>2.0.ZU;2-5
Abstract
Single-phase electrolytic Nb3Sn coatings for microwave applications ar e studied by Auger electron spectroscopy combined with depth profiling by Ar-ion milling. The effect of substrate surface condition on the d istribution of oxygen, carbon, and nitrogen interstitials across the s urface layer on the backside of the coating is examined. The surface c oncentration of nitrogen rises rapidly to become much higher than the bulk concentration as the surface layer is removed by ion milling. The possible mechanisms of this effect are discussed.