IMPROVEMENT OF STOICHIOMETRY IN SEMIINSULATING GALLIUM-ARSENIDE GROWNUNDER MICROGRAVITY

Citation
Ly. Lin et al., IMPROVEMENT OF STOICHIOMETRY IN SEMIINSULATING GALLIUM-ARSENIDE GROWNUNDER MICROGRAVITY, Journal of crystal growth, 191(3), 1998, pp. 586-588
Citations number
9
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
191
Issue
3
Year of publication
1998
Pages
586 - 588
Database
ISI
SICI code
0022-0248(1998)191:3<586:IOSISG>2.0.ZU;2-X
Abstract
A semi-insulating (SI) GaAs single crystal was recently grown in a ret rievable satellite. The average etch pit density (EPD) of dislocations in the crystal revealed by molten KOH is 2.0 x 10(4) cm(-2), and the highest EPD is 3.1 x 10(4) cm(-2) This result indicates a quite good h omogenity of the EPD which is much better than the ground-grown crysta ls. A similar better homogenity of the stoichiometry i.e., the [As]/([ As] + [Ga]) ratio has been found in the space-grown SI-GaAs single cry stal studied nondestructively using a new mapping method based upon X- ray Bond diffraction. The average stoichiometry in the space-grown cry stal is 0.50007 with mean-square deviation of 6x10(-6), while the aver age stoichiometry in ground-grown SI-GaAs crystal is more than 0.50010 . (C) 1998 Elsevier Science B.V. All rights reserved.