Ly. Lin et al., IMPROVEMENT OF STOICHIOMETRY IN SEMIINSULATING GALLIUM-ARSENIDE GROWNUNDER MICROGRAVITY, Journal of crystal growth, 191(3), 1998, pp. 586-588
A semi-insulating (SI) GaAs single crystal was recently grown in a ret
rievable satellite. The average etch pit density (EPD) of dislocations
in the crystal revealed by molten KOH is 2.0 x 10(4) cm(-2), and the
highest EPD is 3.1 x 10(4) cm(-2) This result indicates a quite good h
omogenity of the EPD which is much better than the ground-grown crysta
ls. A similar better homogenity of the stoichiometry i.e., the [As]/([
As] + [Ga]) ratio has been found in the space-grown SI-GaAs single cry
stal studied nondestructively using a new mapping method based upon X-
ray Bond diffraction. The average stoichiometry in the space-grown cry
stal is 0.50007 with mean-square deviation of 6x10(-6), while the aver
age stoichiometry in ground-grown SI-GaAs crystal is more than 0.50010
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