ANTI-SCATTERING X-RAY GRID

Citation
Cm. Tang et al., ANTI-SCATTERING X-RAY GRID, Microsystem technologies, 4(4), 1998, pp. 187-192
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
ISSN journal
09467076
Volume
4
Issue
4
Year of publication
1998
Pages
187 - 192
Database
ISI
SICI code
0946-7076(1998)4:4<187:>2.0.ZU;2-W
Abstract
Various optical or x-ray applications require reduction of scattered r adiation on the imaging detector to produce sharper images. The scatte red radiation is reduced when the radiation impacting on the detector is from a chosen small solid angle. This requires a mask in front of t he detector with small holes and high aspect ratio. We are applying th e SLIGA process to perform a proof-of-principle demonstration with the capability of making a large and high area anti-scattering grid. The approach is by assembling and stacking small pieces of grid. To mainta in high throughput of the desired radiation, the wall of the grid has to be thin. We designed and fabricated four grid patterns all with 20 mu m thick walls and 80 mu m x 80 mu m holes. The individual pieces we re 210 mu m high and made of nickel. The pieces were assembled and sta cked to make a 5 mm x 5 mm grid 2.1 mm high. Much larger grids can be made by the SLIGA process, which was chosen because of its capability to fabricate high aspect ratio devices with precision.