MICRO FLUIDIC CONTROL-SYSTEMS IN DEEP-ETCH OPTICAL LITHOGRAPHY

Microfluidic devices and components have the potential to provide robu st and reliable controllers for process and control systems within the chemical and nuclear industries. Two fluidic amplifier devices are de scribed and operational results based upon CFD simulations reported. T he physical operation of both devices is examined. Simulations indicat e that pressures of up to 30 kPa can be switched in less than 1 ms by a pressure of the order of 3 kPa. Each component is intended to form p art of a complex combinational control system. Fabrication by the deep etch LIGA process is expected to enhance device versatility by ensuri ng package sizes are as small as possible. Simulated results suggest t hat with device heights of 500 mu m, operational integrity can be main tained.