Bi. Choi et al., IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3020-3025
An adaptively calibrated Pyrometer (ACP) is employed to measure the su
bstrate surface temperature during the YBa2Cu3O7-delta film growth pro
cess. The film-thickness-dependent emittance of the film-substrate com
posite is determined from thin-film optics for instantaneous calibrati
on of the pyrometer. The optical constants of the LaAlO3 substrate and
the YBa2Cu3O7-delta film are measured at high temperatures using a Fo
urier transform infrared spectrometer with a special sample holder tha
t controls the sample temperature and oxygen pressure. The accuracy an
d precision of the ACP are demonstrated through both in situ and ex si
tu measurements. The present study facilitates exact and reproducible
temperature control in high-T(c) superconducting film growth processes
.