IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION

Citation
Bi. Choi et al., IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3020-3025
Citations number
17
Categorie Soggetti
Physics, Applied
ISSN journal
07342101
Volume
11
Issue
6
Year of publication
1993
Pages
3020 - 3025
Database
ISI
SICI code
0734-2101(1993)11:6<3020:ISMIHS>2.0.ZU;2-A
Abstract
An adaptively calibrated Pyrometer (ACP) is employed to measure the su bstrate surface temperature during the YBa2Cu3O7-delta film growth pro cess. The film-thickness-dependent emittance of the film-substrate com posite is determined from thin-film optics for instantaneous calibrati on of the pyrometer. The optical constants of the LaAlO3 substrate and the YBa2Cu3O7-delta film are measured at high temperatures using a Fo urier transform infrared spectrometer with a special sample holder tha t controls the sample temperature and oxygen pressure. The accuracy an d precision of the ACP are demonstrated through both in situ and ex si tu measurements. The present study facilitates exact and reproducible temperature control in high-T(c) superconducting film growth processes .