Kl. Jensen et al., ADVANCED EMITTERS FOR NEXT-GENERATION RF AMPLIFIERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2038-2048
Next generation rf amplifiers, in particular the inductive output ampl
ifiers (IOAs), will require electron sources characterized by high cur
rent density, high brightness, low emittance, and the ability to be em
ission gated. The strong interaction between the beam and the resonant
or synchronous electromagnetic field may enable compact, highly effic
ient, and moderate gain X-band power booster amplifiers. An analysis o
f amplifier demands on generic emitter candidates is provided. Of the
emitter candidates available, two (namely, field emitter arrays and wi
de-band-gap semiconductors) are amenable to an analysis predicated on
a simple model of field emission from hyperbolas and ellipsoids. The s
imple model is used to investigate two problems of critical concern: f
or field emitter arrays (FEAs), we will investigate the conditions und
er which important space charge effects exist, and from the model pred
ict optimum FEA performance characteristics for rf IOAs; for wide-band
-gap materials, the simple model identifies parameters which limit the
maximum electron transport across a metal-semiconductor interface, th
ereby limiting current flow.