Tm. Bhave et Sv. Bhoraskar, SURFACE WORK FUNCTION STUDIES IN POROUS SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2073-2078
Band structure studies in porous silicon provide useful information ab
out the operative phenomenon responsible for its room temperature phot
oluminescence. We have measured the average surface work function, usi
ng a retarding field diode method in ultrahigh vacuum conditions, for
porous silicon having different crystalline columnar dimensions. The a
verage crystallite size was determined by grazing angle x-ray diffract
ion measurements; whereas the band gap was estimated from the photolum
inescence measurements. Based on these results, different empirical ba
nd structural models are reviewed. Photoconductivity measurements in p
orous silicon also insinuate that the electrical resistivity of the su
rface of porous silicon is manipulated by the silicon complexes presen
t on the surface. It has been concluded that, in addition to the quant
um confinement, the surface molecular species dominantly control the b
ehavior of photoluminescence and average surface work function of poro
us silicon. (C) 1998 American Vacuum Society.