SIMPLE TECHNIQUE FOR MEASURING GRATING PERIODS MADE USING E-BEAM LITHOGRAPHY

Authors
FEDER KS TENNANT DM
Citation
Ks. Feder et Dm. Tennant, SIMPLE TECHNIQUE FOR MEASURING GRATING PERIODS MADE USING E-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2113-2114
Citations number
2
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
16
Issue
4
Year of publication
1998
Pages
2113 - 2114
Database
ISI
SICI code
1071-1023(1998)16:4<2113:STFMGP>2.0.ZU;2-I
Abstract
A simple method for measuring the period of e-beam written gratings is described. The technique allows for measurement of grating periods us ing a light microscope. Grating periods can be determined with a resol ution of about 0.1 Angstrom. Twenty near field holographic photoplates have been made using this method with excellent results. The techniqu e is described for use on a JBX 6000FS electron beam lithography syste m with fine pitch control software, but may be applicable to other sys tems. (C) 1998 American Vacuum Society.