M. Eyckeler et al., NEGATIVE ELECTRON-AFFINITY OF CESIATED P-GAN(0001) SURFACES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2224-2228
The adsorption of cesium on clean n- and p-GaN(0001)- 1 X 1 surfaces a
t 150 K was investigated using x-ray photoemission spectroscopy, photo
emission spectroscopy with monochromatized He I radiation ultraviolet
photoelectron spectroscopy (UPS) and a Kelvin probe (contact potential
difference, CPD). The CPD measurements gave work functions of 3.88 +/
- 0.15 and 3.6 +/- 0.15 eV for clean n- and p-GaN(0001) surfaces, resp
ectively. The widths of UPS energy distribution curves yield an ioniza
tion energy of 6.8+/-0.15 eV. Thus, depletion and inversion layers exi
st at clean surfaces of n- and p-GaN(0001) surfaces, respectively. As
a function of Cs coverage, the work function displays the well-known b
ehavior in that it first decreases, passes through a minimum, and even
tually reaches a value of 2.1 eV, the work function of metallic cesium
. In the submonolayer coverage regime, the ionization energy decreases
by 2.3 +/- 0.15 eV. At clean p-GaN(0001) surfaces the vacuum level li
es by only 0.3 eV above the conduction-band minimum in the bulk. Alrea
dy minute amounts of Cs suffice to produce negative electron affinity.
The Schottky barrier height of metallic Cs films on n-GaN(0001) is de
termined as 0.2+/-0.15 eV. This value is in good agreement with what i
s predicted by the MIGS and electronegativity model. (C) 1998 American
Vacuum Society.