FORMATION OF AN SB-N COMPOUND DURING NITRIDATION OF INSB(001) SUBSTRATES USING ATOMIC NITROGEN

Citation
L. Haworth et al., FORMATION OF AN SB-N COMPOUND DURING NITRIDATION OF INSB(001) SUBSTRATES USING ATOMIC NITROGEN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2254-2260
Citations number
20
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
4
Year of publication
1998
Pages
2254 - 2260
Database
ISI
SICI code
1071-1023(1998)16:4<2254:FOASCD>2.0.ZU;2-M
Abstract
The effect of atomic nitrogen, generated by a radio frequency plasma s ource, on clean InSb(001) at 275 degrees C has been studied using x-ra y photoelectron spectroscopy (XPS) and resonant Raman scattering (RRS) . Chemically shifted XPS features of the Sb 3d region revealed the for mation of a reacted Sb species. This reacted Sb was unambiguously iden tified as mainly Sb-N by comparison with results from as deposited and nitrided, thick elemental Sb layers on InSb. The Sb 3d feature due to this Sb-N species was found to have a chemical shift of 1.65+/-0.10 e V to higher binding energy compared with the InSb peak, while for the elemental Sb the shift was only 0.45+/-0.10 eV in the same direction. Although not obvious from the XPS data the RRS spectra of a much longe r nitridation at 275 degrees C showed the presence of crystalline elem ental Sb. Annealing studies of elemental Sb and nitrided Sb layers sho wed the Sb-N species to be significantly less volatile than elemental Sb. (C) 1998 American Vacuum Society.