REFLECTANCE DIFFERENCE SPECTROSCOPY SPECTRA OF CLEAN (3X2), (2X1), AND C(2X2) 3C-SIC(001) SURFACES - NEW EVIDENCE FOR SURFACE-STATE CONTRIBUTIONS TO OPTICAL ANISOTROPY SPECTRA

Citation
U. Rossow et al., REFLECTANCE DIFFERENCE SPECTROSCOPY SPECTRA OF CLEAN (3X2), (2X1), AND C(2X2) 3C-SIC(001) SURFACES - NEW EVIDENCE FOR SURFACE-STATE CONTRIBUTIONS TO OPTICAL ANISOTROPY SPECTRA, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2355-2357
Citations number
16
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
4
Year of publication
1998
Pages
2355 - 2357
Database
ISI
SICI code
1071-1023(1998)16:4<2355:RDSSOC>2.0.ZU;2-E
Abstract
In this study we applied the surface sensitive optical method reflecta nce difference spectroscopy to investigate the optical response of cle an cubic 3 C-SiC(001) surfaces. The main reconstructions, the Si-rich (3 x 2) and (2 x 1) as well as the C-rich c(2 x 2) were prepared by an nealing in Si flux. For (3 x 2) we find a strong spectral feature at 4 .2 eV that is not observed for the other two reconstructions. Since th e direct gap of 3 C-SiC is at higher photon energies the 4.2 eV featur e must be related to the surface. Angle resolved ultraviolet photoelec tron spectroscopy measurements indicate surface states around the (X) over bar point of the unreconstructed surface Brillouin zone. We concl ude that the 4.2 eV feature is associated with this surface state and suggest that it is linked to the E-2 gap of bulk Si at 4.2 eV. (C) 199 8 American Vacuum Society.