B. Majkusiak, EXPERIMENTAL AND THEORETICAL-STUDY OF THE CURRENT-VOLTAGE CHARACTERISTICS OF THE MISIM TUNNEL TRANSISTOR, I.E.E.E. transactions on electron devices, 45(9), 1998, pp. 1903-1911
Current-voltage (I-V) characteristics of the metal-insulator-semicondu
ctor-insulator-metal (MISIM) tunnel transistor in the common base and
common emitter configurations are studied experimentally and theoretic
ally. The Al-SiO2-Si(n)-SiO2-Al transistors with oxide layers of about
2.5 nm thickness have been manufactured. The devices exhibit current
gain above 30 in the common base configuration and sn;itching in the c
ommon emitter configuration. cl theoretical static model of the MISIM
tunnel transistor has been developed and applied to analyze the measur
ed current-voltage characteristics for both operation configurations.
Excellent fit of the model to the experimental data has been achieved,
Influence of oxide thickness and interface trap density on the switch
ing voltage has been investigated theoretically.