M. Androulidaki et al., UNIFORMITY STUDY IN PM-HEMT STRUCTURES AND DEVICES BY OPTICAL AND ELECTRICAL CHARACTERIZATION, Microelectronic engineering, 43-4, 1998, pp. 567-573
We have studied the uniformity of both the structure and of the device
characteristics of PM-HEMTs on (001) GaAs substrates. The structure u
niformity was studied by photoreflectance modulation spectroscopy (PR)
at room temperature and photoluminescence spectroscopy (PL) at low te
mperature. PR was chosen for its main advantages of high sensitivity i
n room temperature, higher than that of high temperature photoluminesc
ence and non-destructiveness. We have studied the main transitions of
the transistor structures using the 2DEG approximation. PR and PL resu
lts yield uniformity with relative standard deviation (r.s.d.) lower t
han 1%. After PR, transistors were fabricated on the wafers and tested
for DC and RF characteristics and the results were correlated with th
e PR data. The comparison between PR and PL has resulted in a strong i
ndication that PR can be the technique of choice for the complete char
acterization of structure uniformity of 3 inch pseudomorphic heterostr
uctures, since it is non-destructive, relatively simple and can be per
formed at room temperature. (C) 1998 Elsevier Science B.V. All rights
reserved.