Accurate determination of MOSFET effective channel width W(eff) is imp
ortant for process control and device design. Existing methods to dete
rmine W(eff) are sensitive to measurement noise, and to nonlinearities
in the data. In this paper we present a new method to determine W(eff
) that overcomes these problems, The method uses nonlinear optimizatio
n, and is based on a drain current model that accounts for the variati
ons of W(eff), of series resistance, and of threshold voltage, with ma
sked channel width and gate bias. We also show that our new method is
more accurate and less sensitive to measurement procedure than other m
ethods.