PREPARATION AND CHARACTERIZATION OF EPITAXIAL GOLD-FILMS DEPOSITED ONMICA BY DIRECT-CURRENT MAGNETRON SPUTTERING

Authors
ELBEL N BEHNER H VONSEGGERN H
Citation
N. Elbel et al., PREPARATION AND CHARACTERIZATION OF EPITAXIAL GOLD-FILMS DEPOSITED ONMICA BY DIRECT-CURRENT MAGNETRON SPUTTERING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(5), 1995, pp. 2119-2123
Citations number
25
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
5
Year of publication
1995
Pages
2119 - 2123
Database
ISI
SICI code
1071-1023(1995)13:5<2119:PACOEG>2.0.ZU;2-X
Abstract
The preparation of epitaxial Au(lll) films on mica by means of direct current magnetron sputtering is reported. We employed low-energy elect ron diffraction, scanning electron microscopy, and scanning tunneling microscopy to study the surface structure of sputtered gold films at v arious deposition temperatures and substrate cleaning procedures. It w ill be shown that by sputter deposition at 400 degrees C onto oxygen a nnealed mica substrates uniformly textured gold films can be obtained which typically exhibit step-free, atomically hat areas of about 150x1 50 nm(2). (C) 1995 American Vacuum Society.