R. Vankemmel et al., A UNIFIED WIDE TEMPERATURE-RANGE MODEL FOR THE ENERGY-GAP, THE EFFECTIVE CARRIER MASS AND INTRINSIC CONCENTRATION IN SILICON, Solid-state electronics, 36(10), 1993, pp. 1379-1384
In this paper a new model for the intrinsic concentration in silicon i
s derived. It uses new wide temperature range models for the effective
electron and hole masses which are based on fundamental computations
found in literature. Furthermore the available models for the energy g
ap are reviewed. The intrinsic concentration is then computed out of t
hese models and compared with measured data. It is shown that the mode
l is in very close agreement with these data. The three models provide
a unified consistent way for computing these physical values in devic
e simulation.