INTERACTIONS OF METHANOL WITH STOICHIOMETRIC AND DEFECTIVE TIO2(110) AND TIO2(100) SURFACES

Interactions of CH3OH with stoichiometric (nearly defect-free) and def ective TiO2(110) and (100) surfaces have been studied using x-ray phot oelectron spectroscopy and ultraviolet photoemission spectroscopy. The CH3OH saturation coverage was increased by increasing the number of d efects created by electron-beam exposure or Ar+ ion bombardment. A sma ll percentage of any defects produced were healed upon the saturation exposure (defect healing means a reduction in defect signal observed b y the photoemission measurements). The structural influence on the ads orption and surface defect reactivity was found to be less significant for CH3OH than for H2O. The CH3OH coverages at a given exposure and d efect reactivity were comparable for both the (100) and (110) surfaces . (C) 1998 American Vacuum Society. [S0734-2101(98)02005-3].