COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH ONE MICRON THICK OXIDE LAYERS (VOL 16, PG 1825, 1998)

Authors
DIEBOLD AC LINDLEY P VITERALLI J KINGSLEY J LIU BYH WOO KS
Citation
Ac. Diebold et al., COMPARISON OF THE SUBMICRON PARTICLE ANALYSIS CAPABILITIES OF AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SCANNING ELECTRON-MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY FOR PARTICLES DEPOSITED ON SILICON-WAFERS WITH ONE MICRON THICK OXIDE LAYERS (VOL 16, PG 1825, 1998), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 3148-3148
Citations number
1
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
16
Issue
5
Year of publication
1998
Pages
3148 - 3148
Database
ISI
SICI code
0734-2101(1998)16:5<3148:COTSPA>2.0.ZU;2-5