Commercially available sulfur, selenium, tellurium, and arsenic are sh
own to contain impurity inclusions 0.07 to 0.3 mu m in size, consistin
g mainly of carbon. Without additional purification, the concentration
of these inclusions in extrapure samples ranges from 10(6) to 10(9) c
m(-3). Special purification procedures, taking into account the partic
ular behavior of submicron particles, make it possible to reduce the c
oncentration of inclusions to at least 10(4)-10(5) cm(-3). The presenc
e of carbon particles in chalcogens and arsenic should be taken into a
ccount when using these materials for synthesis of optical and semicon
ductor materials.