A. Vaterlaus et al., CROSS-SECTIONAL SCANNING-TUNNELING-MICROSCOPY OF EPITAXIAL GAAS STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1502-1508
The scanning tunneling microscope is used to study GaAs epitaxial stru
ctures, cleaved in ultrahigh vacuum, and viewed in cross section. Two
applications are described: in the first, the net donor concentration
in Si-doped GaAs is deduced by direct measurement of the depletion wid
th at pn junctions. In the vicinity of the pn junctions, net donor con
centrations of greater than 2 X 10(19) cm-3 are observed. This interfa
cial donor activity is an order-of-magnitude higher than that found in
the bulk. In the second application, low-temperature-grown and anneal
ed GaAs is studied. Arsenic precipitates are observed in the material.
The precipitates are found to produce electronic states within the Ga
As band gap, and these states cause the Fermi level to be pinned near
midgap.