Ey. Lee et al., DIFFUSIVE AND INELASTIC-SCATTERING IN BALLISTIC-ELECTRON-EMISSION SPECTROSCOPY AND BALLISTIC-ELECTRON-EMISSION MICROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1579-1583
Ballistic-electron-emission microscopy (BEEM) of Au/Si(001) n type was
done to study whether elastic scattering in the Au overlayer is domin
ant. It was found that there is no dependence of the BEEM current on t
he relative gradient of the Au surface with respect to the Si interfac
e, and this demonstrates that significant elastic scattering must occu
r in the Au overlayer. Ballistic-electron-emission spectroscopy (BEES)
was also done, and, rather than using the conventional direct-current
BEES, alternating-current (ac) BEES was done on Au/Si and also on Au/
PtSi/Si(001) n type. The technique of ac BEES was found to give linear
threshold for the Schottky barrier, and it also clearly showed the on
set of electron-hole pair creation and other inelastic scattering even
ts. The study of device quality PtSi in Au/PtSi/Si(001) yielded an att
enuation length of 4 nm for electrons of energy 1 eV above the PtSi Fe
rmi energy.