Jt. Mckinley et al., FREE-ELECTRON LASER INTERNAL PHOTOEMISSION MEASUREMENTS OF HETEROJUNCTION BAND DISCONTINUITIES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1614-1616
Internal photoemission (IPE) measurements of the conduction band disco
ntinuities at GaAs/amorphous-Ge interfaces have been carried out at th
e Vanderbilt Free-Electron Laser (FEL). IPE is a simple and direct mea
surement capable of unprecedented accuracy. The FEL is uniquely equipp
ed for semiconductor spectroscopy due to its brightness, tunability, a
nd spectral range, 1-8 mum (0.15-1.2 eV). IPE uses FEL photons of suff
icient energy to optically pump electrons over the conduction band dis
continuity, producing a photocurrent. No complex modeling is required
to extract the discontinuity from the experimental data, since it coin
cides with photocurrent threshold energy. Both linear and Fowler curve
fits of the threshold region agree within an accuracy of +/-5 meV. Th
e IPE measurements are in agreement with previous conventional vacuum
photoemission measurements that were limited to +/-100 meV accuracy. U
nlike conventional vacuum photoemission, IPE does not have the require
ment that interfaces must be grown and measured in situ. Since FEL-IPE
utilizes subband pp photons, it can be applied to buried interfaces,
as well as interfaces under bias. Because of its accuracy and simplici
ty, systematic use of this technique over a broad range of semiconduct
or interfaces promises to resolve long-standing disagreements between
competing semiconductor band-lineup theories.