The synthetic porous SiO2 polymorph decasil crystallizes in the monocl
inic space group C2/m. Its structure is characterized by interconnecte
d rods of small cages built up from SiO4 tetrahedra. These rods are al
igned parallel to the c axis. Decasil often displays structural disord
er producing diffuse X-ray diffraction effects, which consist of strea
ks between Bragg reflections. These streaks are constrained to layers
of the reciprocal lattice perpendicular to the c axis. Combining knowl
edge of the crystal structure and the observation of diffuse diffracti
on, a model of disorder and a method to calculate the diffuse diffract
ion intensity are developed. The model of disorder involving different
ly oriented rods allows the application of a recursive method of inten
sity calculation, previously developed for stacking faults.