X-RAY FINE-STRUCTURE INVESTIGATION OF GERMANIUM NANOCLUSTERS

Authors
BLASING J KOHLERT P ZACHARIAS M VEIT P
Citation
J. Blasing et al., X-RAY FINE-STRUCTURE INVESTIGATION OF GERMANIUM NANOCLUSTERS, Journal of applied crystallography, 31, 1998, pp. 589-593
Citations number
7
Categorie Soggetti
Crystallography
Journal title
Journal of applied crystallography → ACNP
ISSN journal
00218898
Volume
31
Year of publication
1998
Part
4
Pages
589 - 593
Database
ISI
SICI code
0021-8898(1998)31:<589:XFIOGN>2.0.ZU;2-J
Abstract
Germanium nanostructures embedded in amorphous SiOx matrices were inve stigated by different X-ray techniques. We report either randomly dist ributed or layer-organized arrangements of the nanoclusters or nanocry stals, depending on the sputtering conditions. Recrystallization was f ound to occur by annealing the films near the melting point of germani um.