EFFECT OF THERMAL DIFFUSE-SCATTERING IN TRIPLE-CRYSTAL DIFFRACTOMETRYWITH HIGH-ENERGY SYNCHROTRON-RADIATION

Authors
SCHMIDT T WOO D KEITEL S SCHNEIDER JR LAMBERT U ZULEHNER W
Citation
T. Schmidt et al., EFFECT OF THERMAL DIFFUSE-SCATTERING IN TRIPLE-CRYSTAL DIFFRACTOMETRYWITH HIGH-ENERGY SYNCHROTRON-RADIATION, Journal of applied crystallography, 31, 1998, pp. 625-633
Citations number
12
Categorie Soggetti
Crystallography
Journal title
Journal of applied crystallography → ACNP
ISSN journal
00218898
Volume
31
Year of publication
1998
Part
4
Pages
625 - 633
Database
ISI
SICI code
0021-8898(1998)31:<625:EOTDIT>2.0.ZU;2-Y
Abstract
The thermal diffuse scattering around reflection 220 of a thick, perfe ct silicon crystal has been studied quantitatively by means of a tripl e-crystal diffractometer and 100 keV synchrotron radiation. The necess ary fitting procedures were simplified by deriving an analytic solutio n to the instrumental resolution function for nondispersive setting of three perfect crystals. The temperature and q dependence of the therm al diffuse scattering are very well described, taking only acoustical phonons into account; the contribution of optical phonons has been cal culated explicitly.