NUMERICAL-ANALYSIS OF DEVICE PERFORMANCE OF METAMORPHIC INYAL1-YAS INXGA1-XAS LESS-THAN-OR-EQUAL-TO-X-LESS-THAN-OR-EQUAL-TO-0.6) HEMTS ON GAAS SUBSTRATE/

Citation
H. Happy et al., NUMERICAL-ANALYSIS OF DEVICE PERFORMANCE OF METAMORPHIC INYAL1-YAS INXGA1-XAS LESS-THAN-OR-EQUAL-TO-X-LESS-THAN-OR-EQUAL-TO-0.6) HEMTS ON GAAS SUBSTRATE/, I.E.E.E. transactions on electron devices, 45(10), 1998, pp. 2089-2095
Citations number
40
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
45
Issue
10
Year of publication
1998
Pages
2089 - 2095
Database
ISI
SICI code
0018-9383(1998)45:10<2089:NODPOM>2.0.ZU;2-Y
Abstract
A numerical model describing the influence of InAs mole fraction on me tamorphic HEMT structures ((MM-HEMT) is proposed. The material propert ies are calculated using the Monte Carlo method, while the charge cont rol law is calculated using a self-consistent solution of Poisson's an d Schrodinger's equations. The modeling of the de, ac, noise and high frequency performance of a device with 0.25-mu m gate length is perfor med using the quasi-two-dimensional (Q2D) approach, This analysis show s that an InAs mole fraction of about 0.40 is an optimum composition f or manufacturing high gain, low noise amplifiers, In this range of com position, the performance of MM-HEMT structures is similar to that obt ained for lattice-matched HEMT's on InP substrates,