AVALANCHE MULTIPLICATION NOISE CHARACTERISTICS IN THIN GAAS P(-I-N(+)DIODES())

Citation
Kf. Li et al., AVALANCHE MULTIPLICATION NOISE CHARACTERISTICS IN THIN GAAS P(-I-N(+)DIODES()), I.E.E.E. transactions on electron devices, 45(10), 1998, pp. 2102-2107
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
45
Issue
10
Year of publication
1998
Pages
2102 - 2107
Database
ISI
SICI code
0018-9383(1998)45:10<2102:AMNCIT>2.0.ZU;2-N
Abstract
Avalanche noise measurements have been performed on a range of homojun ction GaAs p(+)-i-n(+) and n(+)-i-p(+) diodes with ''i'' region widths , w from 2.61 to 0.05 mu m. The results show that for w less than or e qual to 1 mu m the dependence of excess noise factor F on multiplicati on does not follow the well-established continuous noise theory of McI ntyre [1], Instead, a decreasing noise factor is observed as w decreas es for a constant multiplication. This reduction in F occurs for both electron and hole initiated multiplication in the thinner w structures even though the ionization coefficient ratio is close to unity. The d ead-space, the minimum distance a carrier must travel to gain the ioni zation threshold energy, becomes increasingly important in these thinn er structures and largely accounts for the reduction in noise,