PLASMA-INDUCED LOW-TEMPERATURE GROWTH OF GRAPHITIC NANOFIBERS ON NICKEL SUBSTRATES

Citation
Y. Chen et al., PLASMA-INDUCED LOW-TEMPERATURE GROWTH OF GRAPHITIC NANOFIBERS ON NICKEL SUBSTRATES, Journal of crystal growth, 193(3), 1998, pp. 342-346
Citations number
22
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
193
Issue
3
Year of publication
1998
Pages
342 - 346
Database
ISI
SICI code
0022-0248(1998)193:3<342:PLGOGN>2.0.ZU;2-#
Abstract
Graphitic nanofibers have been synthesized on Ni(1 0 0) substrates via DC plasma chemical vapor deposition using a gas mixture of hydrogen a nd methane. The diameter of the fibers is in the range 50-200 nm, cont rolled by the size of the nickel tip of each fiber. The substrate temp erature during deposition was 350-400 degrees C. No special treatment of the substrate was employed to promote the nucleation of nanofibers, though scratches on the substrate surface were found to be favorable for the nucleation of the fibers. Scanning electron microscopy. transm ission electron microscopy. energy dispersive spectroscopy and Raman s pectroscopy were used to characterize the fibers obtained. The effect of the plasma on the growth of the fibers low temperature is discussed . (C) 1998 Elsevier Science B.V. All rights reserved.