DEEP CENTERS IN UNDOPED SEMIINSULATING INP

Citation
Zq. Fang et al., DEEP CENTERS IN UNDOPED SEMIINSULATING INP, Journal of electronic materials, 27(10), 1998, pp. 68-71
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
10
Year of publication
1998
Pages
68 - 71
Database
ISI
SICI code
0361-5235(1998)27:10<68:DCIUSI>2.0.ZU;2-7
Abstract
Undoped semi-insulating (SI) InP samples, subjected to one-step and mu lti-step wafer annealing, and lightly and normally Fe-doped SI InP sam ples without annealing have been characterized by thermally stimulated current (TSC) spectroscopy. A dominant deep center at 0.63 eV is foun d in all samples and is undoubtedly due to iron. Two prominent TSC tra ps, T-b (0.44 eV) and T-d (0.33 eV), found in undoped SI InP, are thou ght to be related to the phosphorus antisite P-In, and traps at low te mperatures, like T-e (0.19 eV), to the phosphrus vacancy V-P.