In this work, a fast identification of I,,, failures using spectroscop
ic photon emission microscopy (SPEMMI) is proposed. The spectra obtain
ed from failure sites on the I,,, failed chips were compared with the
ones of known defective components. Four distinguishable spectra categ
ories were identified. They were attributed to gate oxide breakdown, m
etal shorts, blackbody radiation, and ESD caused junction spiking. The
focused ion beam (FIB) technique was used to look at the damage sites
for confirmation of the SPEMMI results. (C) 1998 Elsevier Science Ltd
. All rights reserved.