ANALYSIS OF I-DDQ FAILURES BY SPECTRAL PHOTON-EMISSION MICROSCOPY

Citation
M. Rasras et al., ANALYSIS OF I-DDQ FAILURES BY SPECTRAL PHOTON-EMISSION MICROSCOPY, Microelectronics and reliability, 38(6-8), 1998, pp. 877-882
Citations number
6
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
38
Issue
6-8
Year of publication
1998
Pages
877 - 882
Database
ISI
SICI code
0026-2714(1998)38:6-8<877:AOIFBS>2.0.ZU;2-U
Abstract
In this work, a fast identification of I,,, failures using spectroscop ic photon emission microscopy (SPEMMI) is proposed. The spectra obtain ed from failure sites on the I,,, failed chips were compared with the ones of known defective components. Four distinguishable spectra categ ories were identified. They were attributed to gate oxide breakdown, m etal shorts, blackbody radiation, and ESD caused junction spiking. The focused ion beam (FIB) technique was used to look at the damage sites for confirmation of the SPEMMI results. (C) 1998 Elsevier Science Ltd . All rights reserved.