LOW-FREQUENCY NOISE-ANALYSIS AS A DIAGNOSTIC-TOOL TO ASSESS THE QUALITY OF 0.25-MU-M TI-SILICIDED POLY LINES

Citation
Ep. Vandamme et al., LOW-FREQUENCY NOISE-ANALYSIS AS A DIAGNOSTIC-TOOL TO ASSESS THE QUALITY OF 0.25-MU-M TI-SILICIDED POLY LINES, Microelectronics and reliability, 38(6-8), 1998, pp. 925-929
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
38
Issue
6-8
Year of publication
1998
Pages
925 - 929
Database
ISI
SICI code
0026-2714(1998)38:6-8<925:LNAADT>2.0.ZU;2-J
Abstract
In this paper, de and low frequency noise measurement results on Ti-si licided poly lines are presented and analysed. Besides Raman scatterin g [1], low frequency noise analysis gives additional information on th e presence and the spatial distribution of the high resistive C49 phas e in the silicide line. The low frequency noise is strongly dependent on whether or not the distribution of the C49 phase is uniform or spot ted-like. The experimental results agree with our model for a uniform C49 phase distribution over the silicided line. A spotted-like distrib ution of the C49 phase, which causes non-uniform current densities, ca n not explain the observed noise behaviour. (C) 1998 Elsevier Science Ltd. All rights reserved.