J. Vanolmen et al., OVERVIEW OF THE KINETICS OF THE EARLY STAGES OF ELECTROMIGRATION UNDER LOW (= REALISTIC) CURRENT-DENSITY STRESS, Microelectronics and reliability, 38(6-8), 1998, pp. 1009-1013
The early stages of electromigration (EM) have been studied under real
istic, i.e. low current densities (j<0.5 MA/cm(2)) using a high resolu
tion resistance measurement technique. I,ow current densities initiate
EM and discard other masking mechanisms allowing an accurate observat
ion of the EM kinetics, revealing fundamental features such as incubat
ion time and subsequent linear resistance increase, important for mode
lling and life time extrapolation purposes. Current and temperature de
pendences are investigated and compared with the results obtained with
high current density tests. For the first time it is shown that the p
rocesses responsible for the incubation time are reversible in nature.
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