A COMPARISON BETWEEN NORMALLY AND HIGHLY ACCELERATED ELECTROMIGRATIONTESTS

Authors
FOLEY S SCORZONI A BALBONI R IMPRONTA M DEMUNARI I MATHEWSON A FANTINI F
Citation
S. Foley et al., A COMPARISON BETWEEN NORMALLY AND HIGHLY ACCELERATED ELECTROMIGRATIONTESTS, Microelectronics and reliability, 38(6-8), 1998, pp. 1021-1027
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
Microelectronics and reliability → ACNP
ISSN journal
00262714
Volume
38
Issue
6-8
Year of publication
1998
Pages
1021 - 1027
Database
ISI
SICI code
0026-2714(1998)38:6-8<1021:ACBNAH>2.0.ZU;2-#
Abstract
Normally and highly accelerated electromigration tests on Al-Cu lines of different widths are compared. It is shown that the use of the Blac k equation gives different extrapolated results depending on the range of stress conditions considered. It is concluded that for extrapolati ons it is safe to use the Black equation only in the case of normally accelerated stress conditions (temperatures in the range 158-240 degre es C and current densities between 1 and 2 MA/cm(2)) and when the extr acted value for the current density acceleration factor is 2. (C) 1998 Elsevier Science Ltd. All rights reserved.