MODELING AND SIMULATION OF HOT-CARRIERS DEGRADATION OF HIGH-VOLTAGE FLOATING LATERAL NDMOS TRANSISTORS

Citation
E. Vandenbossche et al., MODELING AND SIMULATION OF HOT-CARRIERS DEGRADATION OF HIGH-VOLTAGE FLOATING LATERAL NDMOS TRANSISTORS, Microelectronics and reliability, 38(6-8), 1998, pp. 1097-1101
Citations number
3
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
38
Issue
6-8
Year of publication
1998
Pages
1097 - 1101
Database
ISI
SICI code
0026-2714(1998)38:6-8<1097:MASOHD>2.0.ZU;2-P
Abstract
This paper presents the Hot Carrier Endurance of a High Voltage (100V) self aligned Floating lateral nDMOS transistor. Based on experimental results, a Safe Operating Area is determined according to maximum 10% shift of electrical parameters within 25 years. Process/Device simula tion has been done in order to understand the degradation phenomena ba sed on bulk current. Two points of high Impact Ionization rates have b een found : one close to the channel junction but in depth, and the se cond one in the drift region. This later explains the Hot Carrier Degr adation of the R-on parameter observed experimentally. (C) 1998 Elsevi er Science Ltd. All rights reserved.