A new method to extract the different electrical parameters lifetime o
f MOS transistors submitted to hot carriers degradation is proposed. T
his method leads to error on the lifetime below 15%, even if the param
eter variation measurement reaches only 8%. The robustness of this met
hod has been tested for various biases of stress and different technol
ogies representative of different ageing mechanisms. Finally this meth
od is a good indicator of the degradation modes occurring during the s
tress. (C) 1998 Elsevier Science Ltd. All rights reserved.