Ch. Chen et al., COMBINED METHOD OF FOCUSED ION-BEAM MILLING AND ION-IMPLANTATION TECHNIQUES FOR THE FABRICATION OF HIGH-TEMPERATURE SUPERCONDUCTOR JOSEPHSON-JUNCTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2898-2901
We have studied the T-c degradation of epitaxial YB2Cu3O7-x (YBCO) fil
ms on (100) LaAlO3 substrates implanted with 100 keV O+ ions at differ
ent conditions. The influence of Au mask thickness and the implantatio
n doses on the film characteristics have been investigated systematica
lly. YBCO bridges have been modified by local oxygen ion implantation
at optimal condition through a narrow trench in an Au/photoresist mask
, which was fabricated formed by focused ion beam milling and reactive
ion etching. The critical current and normal resistance of the modifi
ed bridges were found to be characteristic of superconductor/normal/su
perconductor Josephson junction behavior. Microwave irradiation of the
junctions resulted in Shapiro steps in the I-V characteristics. (C) 1
998 American Vacuum Society.