SIMPLE, COMPACT, HIGH-PURITY CR EVAPORATOR FOR ULTRAHIGH-VACUUM

Authors
MCCLELLAND JJ UNGURIS J SCHOLTEN RE PIERCE DT
Citation
Jj. Mcclelland et al., SIMPLE, COMPACT, HIGH-PURITY CR EVAPORATOR FOR ULTRAHIGH-VACUUM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(5), 1993, pp. 2863-2864
Citations number
4
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
11
Issue
5
Year of publication
1993
Pages
2863 - 2864
Database
ISI
SICI code
0734-2101(1993)11:5<2863:SCHCEF>2.0.ZU;2-M
Abstract
A simple, compact Cr evaporator is constructed by electroplating Cr me tal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min-1 (flux almost-equal-to 10(19) atoms m-2 s-1) have been obtained, with total deposition thickness in exces s of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability.