Jj. Mcclelland et al., SIMPLE, COMPACT, HIGH-PURITY CR EVAPORATOR FOR ULTRAHIGH-VACUUM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(5), 1993, pp. 2863-2864
A simple, compact Cr evaporator is constructed by electroplating Cr me
tal onto the tip of a W hairpin filament. At 5 cm from the evaporator,
deposition rates up to 10 nm min-1 (flux almost-equal-to 10(19) atoms
m-2 s-1) have been obtained, with total deposition thickness in exces
s of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum
show impurities below detectability.