Y. Fujisaki et al., DEGRADATION-FREE FERROELECTRIC PB(ZR,TI)O-3 THIN-FILM CAPACITORS WITHIRO2 TOP ELECTRODE, Integrated ferroelectrics (Print), 21(1-4), 1998, pp. 83-95
Degradation of ferroelectricity in PZT (Pb(Zr-0.52,Ti-0.48)O-3) thin-f
ilm capacitors caused by heat treatment in a reductive ambience is inv
estigated. We have found that the degradation of ferroelectricity depe
nds upon the metal used for the top electrode of the PZT capacitor. Th
e increased degradation in the case of a PZT capacitor with Pt electro
des can be explained by a catalytic reaction on the Pt surface. With t
he use of an IrO2 non-catalytic top electrode, we have made the ferroe
lectricity of an IrO2/PZT/Pt capacitor retained even after the H-2 ann
ealing at 400 degrees C, or above. This IrO2/PZT/Pt capacitor is a use
ful structure to avoid H-2 damage in actual LSI fabrication processes.