DEGRADATION-FREE FERROELECTRIC PB(ZR,TI)O-3 THIN-FILM CAPACITORS WITHIRO2 TOP ELECTRODE

Citation
Y. Fujisaki et al., DEGRADATION-FREE FERROELECTRIC PB(ZR,TI)O-3 THIN-FILM CAPACITORS WITHIRO2 TOP ELECTRODE, Integrated ferroelectrics (Print), 21(1-4), 1998, pp. 83-95
Citations number
19
Categorie Soggetti
Physics, Condensed Matter","Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
10584587
Volume
21
Issue
1-4
Year of publication
1998
Pages
83 - 95
Database
ISI
SICI code
1058-4587(1998)21:1-4<83:DFPTCW>2.0.ZU;2-P
Abstract
Degradation of ferroelectricity in PZT (Pb(Zr-0.52,Ti-0.48)O-3) thin-f ilm capacitors caused by heat treatment in a reductive ambience is inv estigated. We have found that the degradation of ferroelectricity depe nds upon the metal used for the top electrode of the PZT capacitor. Th e increased degradation in the case of a PZT capacitor with Pt electro des can be explained by a catalytic reaction on the Pt surface. With t he use of an IrO2 non-catalytic top electrode, we have made the ferroe lectricity of an IrO2/PZT/Pt capacitor retained even after the H-2 ann ealing at 400 degrees C, or above. This IrO2/PZT/Pt capacitor is a use ful structure to avoid H-2 damage in actual LSI fabrication processes.