CHEMICAL SOLUTION DEPOSITION (CSD) AND CHARACTERIZATION OF FERROELECTRIC AND DIELECTRIC THIN-FILMS

Authors
SOLAYAPPAN N JOSHI V DEVILBISS A BACON J CUCHIARO J MCMILLAN L DEARAUJO CP
Citation
N. Solayappan et al., CHEMICAL SOLUTION DEPOSITION (CSD) AND CHARACTERIZATION OF FERROELECTRIC AND DIELECTRIC THIN-FILMS, Integrated ferroelectrics (Print), 22(1-4), 1998, pp. 521-531
Citations number
4
Categorie Soggetti
Physics, Condensed Matter","Engineering, Eletrical & Electronic","Physics, Applied
Journal title
Integrated ferroelectrics (Print) → ACNP
ISSN journal
10584587
Volume
22
Issue
1-4
Year of publication
1998
Pages
521 - 531
Database
ISI
SICI code
1058-4587(1998)22:1-4<521:CSD(AC>2.0.ZU;2-B
Abstract
This invited paper discusses chemical solution deposition (CSD) and ch aracterization of ferroelectric and dielectric thin films. Liquid Sour ce Misted Chemical Deposition (LSMCD) technology was employed to depos it thin films using Metal Organic Decomposition (MOD) precursors. The configuration of the LSMCD machine along with deposition conditions an d parameters are discussed in detail. Thickness uniformity, repeatabil ity and step coverage data are also reported. Finally, electrical prop erties of thin Y1 and BST films deposited by LSMCD are discussed.