K. Kato, CHEMICAL ROUTES FOR LOW-TEMPERATURE PROCESSING OF LAYER-STRUCTURED PEROVSKITE THIN-FILMS, Integrated ferroelectrics (Print), 22(1-4), 1998, pp. 533-542
A complex alkoxide, Sr[BiTa(OC2H5)(9)](2), was prepared as the precurs
or for SrBi2Ta2O9 (SBT) thin films. The film deposited by using the et
hanolic solution of the precursor crystallized to SET below 500 degree
s C by rapid thermal annealing in an oxygen flow. The calcination at 2
50 degrees C in a mixture of water vapor and oxygen following the rapi
d thermal annealing was found to be effective for improvement of the c
rystallinity and the development of the microstructure in the SET film
s. The 650 degrees C annealed film exhibited the saturated hysteresis
loop at 5 V and improved endurance behavior.