CURIE-VON-SCHWEIDLER BEHAVIOR OBSERVED IN FERROELECTRIC THIN-FILMS AND COMPARISON TO SUPERPARAELECTRIC THIN-FILM MATERIALS

Dielectric relaxation has been observed for a wide variety of material s. Specifically for dielectric thin films, a typical Curie - von Schwe idler relaxation has been reported by many groups in the literature. A lthough some possible reasons for these relaxation phenomena have been discussed, a comprehensive understanding of the physical origins for all of these materials has not be obtained. Summarizing, not only our results, we present a physical model, which consistently explains the origin of the Curie-von Schweidler behavior for the wide variety of in vestigated thin film materials.