A hexapole corrector system was constructed for compensation of the sp
herical aberration of the objective lens of a transmission electron mi
croscope. Implementing this system on a commercial 200 kV instrument w
ith a held emission gun the spherical aberration correction was demons
trated and an improvement of the point resolution from 0.24 nm to bett
er than 0.14 nm was realized. Applying the new instrument to structure
studies on Si/CoSi2 interfaces it was demonstrated that an outstandin
g additional advantage of aberration correction is the substantially r
educed contrast delocalization in high-resolution images. (C) 1998 Els
evier Science B.V. All rights reserved.