OPTIMUM GROWTH AND PROPERTIES OF ZNS GAAS(100) EPILAYERS BY HOT-WALL EPITAXY/

Citation
S. Nam et al., OPTIMUM GROWTH AND PROPERTIES OF ZNS GAAS(100) EPILAYERS BY HOT-WALL EPITAXY/, Journal of crystal growth, 194(1), 1998, pp. 61-69
Citations number
29
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
194
Issue
1
Year of publication
1998
Pages
61 - 69
Database
ISI
SICI code
0022-0248(1998)194:1<61:OGAPOZ>2.0.ZU;2-8
Abstract
High quality ZnS epilayers were grown on GaAs (1 0 0) substrates by ho t-wall epitaxy. From the lattice parameter and its dependence on the s ubstrate temperature, it is found that there remains tensile strain in ZnS epilayers. The thickness dependence of the full-width at half-max imum of the double crystal rocking curves shows that the quality of th e epilayers is good and gets better for thicker films. The very strong and very sharp exciton peaks near the band-edge with hardly observabl e deep level emissions indicate the high quality of the epilayers. The free exciton peak was observed up to room temperature and shifts to l ower energy with increasing measurement temperature, which is due to t he thermal tensile strain. From the temperature dependence of the free exciton energy, the room temperature energy gap was found to be 3.729 eV. (C) 1998 Elsevier Science B.V. All rights reserved.